Gigaphoton Inc. (Head Office: Oyama, Tochigi; President and CEO: Tatsuo Enami), a manufacturer of lightsources for semiconductor lithography, announced that it has delivered an excimer laser for ...

Acton Optics & Coatings has developed a 193nm XL high-reflectance coating that is ideal for lowfluence, high-repetition-rate excimer laser applications, particularly those associated with ...

Gigaphoton Inc. (Head Office: Oyama, Tochigi; President and CEO: Tatsuo Enami), a manufacturer of lightsources for semiconductor lithography, announced its participation in the Moonshot Research and ...

Gigaphoton, the Japanese company that provides excimer lasers for semiconductor lithography applications, says it will double production capacity of the light sources by 2023. The decision comes in ...

Add Yahoo as a preferred source to see more of our stories on Google. Scientists from the Chinese Academy of Sciences (CAS) have reportedly made a major 'breakthrough' in solid-state deep ultraviolet ...

OYAMA, Japan--(BUSINESS WIRE)--Gigaphoton Inc. (Head Office: Oyama, Tochigi; President and CEO: Katsumi Uranaka), a leading manufacturer of light sources used in semiconductor lithography, has ...

Luton, Bedfordshire, United Kingdom, May 20, 2025 (GLOBE NEWSWIRE) -- The high-energy excimer laser mirror market encompasses specialized optical components (mirrors and coatings) used in ultraviolet ...

LONDON--(BUSINESS WIRE)--According to the latest market study released by Technavio, the global semiconductor photolithography equipment market is projected to grow to USD 8.19 billion by 2021, at a ...

OYAMA, Japan, December 08, 2025--(BUSINESS WIRE)--Gigaphoton Inc. (Head Office: Oyama, Tochigi; President and CEO: Tatsuo Enami), a manufacturer of lightsources for semiconductor lithography, ...

OYAMA, Japan, September 18, 2025--(BUSINESS WIRE)--Gigaphoton Inc. (Head Office: Oyama, Tochigi; President and CEO: Tatsuo Enami), a manufacturer of lightsources for semiconductor lithography, ...

Excimer lasers generate intense UV light pulses (typically 193–351 nm) and are employed in precision applications such as semiconductor lithography, advanced manufacturing (e.g. laser micromachining), ...