(Nanowerk News) Toshiba Corporation and the National Institute of Advanced Industrial Science and Technology (AIST) today announced joint development of a mask pattern optimizing technology that ...

Semiconductor Engineering sat down to discuss lithography and photomask technologies with Gregory McIntyre, director of the Advanced Patterning Department at Imec; Harry Levinson, senior fellow and ...

TOKYO, December 12, 2024--(BUSINESS WIRE)--Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for photomasks for logic semiconductors of ...

Computational lithography and mask optimization techniques are at the forefront of enabling the semiconductor industry's continued miniaturisation of integrated circuits. This field encompasses ...

SANTA CLARA, Calif. — A war of words of sorts emerged this week at the SPIE Advanced Lithography conference among vendors developing source mask optimization (SMO) tools in hopes of extending 193-nm ...

There is growing concern over the impact the photomask has on the semiconductor industry's ability to develop new designs. As the industry shifts emphasis from computer-driven products to ...

Semiconductor Engineering sat down to discuss lithography and photomask trends with Bryan Kasprowicz, director of technology and strategy and a distinguished member of the technical staff at ...

LITHOSCALE XT provides up to five-fold increase in throughput versus previous industry benchmark LITHOSCALE system; EVG maskless exposure technology to be highlighted at ECTC 2025 The LITHOSCALE® XT ...

(MENAFN- PR Newswire) With a new dual-stage design, up to six exposure units, a dual-wavelength direct laser source as well as additional hardware and software enhancements, the LITHOSCALE XT offers ...