A new cryogenic plasma etching technique developed by Japanese researchers dramatically accelerates semiconductor fabrication while cutting environmental impact, offering a potential breakthrough for ...
Apple is considering using Intel’s 14A (1.4 nm) manufacturing process as a second source for producing its M-series chips. Apple may use Intel’s 14A node in addition to its current partnership with ...
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To continue reading this content, please enable JavaScript in your browser settings and refresh this page. Preview this article 1 min The semiconductor giant is ...
SAN FRANCISCO (Reuters) -The production process that Intel hoped would pave the way to winning manufacturing deals and restore its edge in churning out high-end, high-margin chips is facing a big ...
Multi-disciplinary team to further develop innovative approach to chip packaging and test manufacturing technology boosting efficiency and flexibility Part of ST’s strategic initiative on ...