Heidelberg, Germany – Heidelberg Instruments has secured two major orders for its VPG + 1400 FPD Volume Pattern Generator from leading photomask manufacturers in Asia, with a total order value between ...
SANTA CLARA, Calif., April 20, 2015 - Applied Materials today announced the Applied Centura ® Tetra (TM) Z Photomask Etch system for etching next-generation optical lithographic photomasks needed by ...
Inverse lithography technology (ILT) is a method of using non-Manhattan shapes on the photomask to produce a wafer more resilient to manufacturing variation. It relies on multi-bream mask writing, ...
SAN JOSE, Calif. — The demise of Etec Systems, the once dominant supplier of semiconductor photomask pattern generators that was quietly shut down by parent company Applied Materials last October, ...
Tokyo-based Dainippon Printing (DNP) and U.S.-based Brion Technologies said today they have initiated a joint development program to improve the productivity and quality of photomask production. The ...
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